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Changzhou Junhe Technology Stock Co.,Ltd

Changzhou Junhe Technology Stock Co.,Ltd is a high-tech enterprise devoted to developing industrial fine chemicals,special equipment and services solution provider which was founded in Changzhou

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Slice Detergent Silicon Wafer Cleaning Easily Cleaning Without Heavy Metal / Foam

Changzhou Junhe Technology Stock Co.,Ltd
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    Buy cheap Slice Detergent Silicon Wafer Cleaning Easily Cleaning Without Heavy Metal / Foam from wholesalers
     
    Buy cheap Slice Detergent Silicon Wafer Cleaning Easily Cleaning Without Heavy Metal / Foam from wholesalers
    • Buy cheap Slice Detergent Silicon Wafer Cleaning Easily Cleaning Without Heavy Metal / Foam from wholesalers
    • Buy cheap Slice Detergent Silicon Wafer Cleaning Easily Cleaning Without Heavy Metal / Foam from wholesalers

    Slice Detergent Silicon Wafer Cleaning Easily Cleaning Without Heavy Metal / Foam

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    Brand Name : JUNHE
    Model Number : JH-216
    Certification : ISO9001 CE ROHS
    Price : Negotiable
    Payment Terms : L/C, T/T
    Supply Ability : 2 Tons per Day
    Delivery Time : Ten days after receipt of advance payment
    • Product Details
    • Company Profile

    Slice Detergent Silicon Wafer Cleaning Easily Cleaning Without Heavy Metal / Foam


    JH-216 High concentration of two components named Silicon Slice Detergent ​ph≥14 Specific weight 1.15-1.25


    1. Brief


    This is patent products for degreasing electron level and solar grade silicon slice in IT and solar battery area, and the patent number is ZL200710020269.6. The product contain double group with good performance in emulsion saponifiation edulcoration to tallowvegetable oilmineral oilsoliquiodgrinding past , also in stripingcomplexing edulcoration to metal ion.


    2. Key feature


    1) double group products with perfect PPR(performance price ratio),Especially suitable for cleaning heavily polluted wafers.


    2) be free from calcium, magnesium, metal, copper, lead and phosphor, and meet the requirement of ROHS.


    3) low foam, no foam overflow in ultrasonic cleaning and friendly to the environment.


    4) good degreasing performance to meet the requirement of high-accuracy IT area in Asian countrys.


    3. Technical parameter


    lassification

    project

    JH-216Test Standard
    AppearanceColorless to yellowish liquidvisualization
    Specific weight1.15-1.25densimeter
    pH≥14PH instrument
    free alkalinity(piont)300-400CYFC

    4. Instructions


    1) put pure water into cleaning tank till three-quarter, then, add agent in 3% -8% concentration, add water till working level, last, heat the bath solution till working temperature.


    2) need to change bath solution completely after degreasing certain amount silicon slice.


    3) reduce exposed time in air to avoid oxidation.


    4) working temperature degree in needed, disposal time: 2-5minutes.


    5. Notes


    1. The ingot after wire cutting should not be stained with water. If it cannot be cleaned in time, it is best to store it in suspension or cleaning agent (all immersed).


    2. Once the wire rod is cut, it must be disposed of immediately. Moreover, the silicon wafer should not be allowed to dry naturally throughout the cleaning process.


    3. The silicon wafer must be kept wet when degumming, and it should not be dried naturally.


    6. Additions


    1) packing:20kg/carton(2kg/bottle),25kg/plastic barrel, 1000kg/barrel


    2) validity time: one year


    Slice Detergent Silicon Wafer Cleaning Easily Cleaning Without Heavy Metal / Foam


    Slice Detergent Silicon Wafer Cleaning Easily Cleaning Without Heavy Metal / Foam

    Quality Slice Detergent Silicon Wafer Cleaning Easily Cleaning Without Heavy Metal / Foam for sale
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